Thermal Nitridation of Chemical Dielectrics as an Easy Approach to Ultra-thin Gate Oxide Processing

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Hauptverfasser:	Bidaud, M., Carrere, J.P., Guyader, F., Juhel, M., Pantel, R.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Applied sciences Chemical processes Dielectrics Electronics Exact sciences and technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors
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creator	Bidaud, M. Carrere, J.P. Guyader, F. Juhel, M. Pantel, R.
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doi_str_mv	10.1109/ESSDERC.2002.194895
format	Conference Proceeding
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identifier	ISBN: 8890084782
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source	IEEE Electronic Library (IEL) Conference Proceedings
subjects	Applied sciences Chemical processes Dielectrics Electronics Exact sciences and technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors
title	Thermal Nitridation of Chemical Dielectrics as an Easy Approach to Ultra-thin Gate Oxide Processing
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