Laser-induced fluorescence detection and kinetics of SiH2 radicals in Ar/H2/SiH4 RF discharges

Laser-induced fluorescence detection and kinetics of SiH2 radicals in Ar/H2/SiH4 RF discharges

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Veröffentlicht in:Journal of physics. D, Applied physics Applied physics, 2000-02, Vol.33 (4), p.381-388
Hauptverfasser: Hertl, Michael, Jolly, Jacques
Format: Artikel
Sprache:eng
Schlagworte:
Electric discharges
Exact sciences and technology
Glow
corona
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
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container_title Journal of physics. D, Applied physics
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creator Hertl, Michael
Jolly, Jacques
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doi_str_mv 10.1088/0022-3727/33/4/311
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ispartof Journal of physics. D, Applied physics, 2000-02, Vol.33 (4), p.381-388
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1361-6463
language eng
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Electric discharges
Exact sciences and technology
Glow
corona
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
title Laser-induced fluorescence detection and kinetics of SiH2 radicals in Ar/H2/SiH4 RF discharges
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