Surface chemical analysis: Determination of surface elemental contamination on silicon wafers by total reflection x-ray fluorescence (TXRF) spectroscopy

Surface chemical analysis: Determination of surface elemental contamination on silicon wafers by total reflection x-ray fluorescence (TXRF) spectroscopy

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Veröffentlicht in:Surface and interface analysis 2002, Vol.33 (4), p.369-370
1. Verfasser: GOHSHI, Yohichi
Format: Artikel
Sprache:eng
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Analytical chemistry
Chemistry
Exact sciences and technology
Spectrometric and optical methods
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ispartof Surface and interface analysis, 2002, Vol.33 (4), p.369-370
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source Wiley Journals
subjects Analytical chemistry
Chemistry
Exact sciences and technology
Spectrometric and optical methods
title Surface chemical analysis: Determination of surface elemental contamination on silicon wafers by total reflection x-ray fluorescence (TXRF) spectroscopy
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