Residual stress states in sputtered Ti1-xSixNy films

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Bibliographische Detailangaben
Veröffentlicht in:	Thin solid films 2002, Vol.402 (1-2), p.195-202
Hauptverfasser:	VAZ, F, REBOUTA, L, GOUDEAU, Ph, RIVIERE, J. P, SCHÄFFER, E, KLEER, G, BODMANN, M
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Materials science Mechanical and acoustical properties Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physical properties of thin films, nonelectronic Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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