In situ control and monitoring of doped and compositionally graded SiGe films using spectroscopic ellipsometry and second harmonic generation

Bibliographische Detailangaben

Hauptverfasser:	MANTESE, L, SELINIDIS, K, WILSON, P. T, LIM, D, JIANG, Y. Y, EKERDT, J. G, DOWNER, M. C
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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