Influence of hydrogen dilution on low-temperature polycrystalline silicon formation using RF excitation SiH4/H2 plasma: Materials for energy conversion

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Veröffentlicht in:	Solar energy materials and solar cells 2000, Vol.62 (1-2), p.187-192
Hauptverfasser:	YAO RUOHE, LIN XUANYING, WU PIN, YU CHUYING, SHI WANGZHOU, LIN KUIXUN
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Exact sciences and technology Low-field transport and mobility piezoresistance Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
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ISSN:	0927-0248 1879-3398