Effect of the Si wafer pretreatment on the patterned substrate morphology and growth of Hg1-xCdxTe PLD films
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| creator | GORBACH, T. Ya HOLINEY, R. Yu MATVEEVA, L. A SVECHNIKOV, S. V VENGER, E. F KUZMA, M WISZ, G |
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| doi_str_mv | 10.1016/S0921-5107(99)00392-X |
| format | Conference Proceeding |
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| fulltext | fulltext |
| identifier | ISSN: 0921-5107 |
| ispartof | Materials science & engineering. B, Solid-state materials for advanced technology, 2000, Vol.71 (1-3), p.288-291 |
| issn | 0921-5107 1873-4944 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_1310261 |
| source | Elsevier ScienceDirect Journals Complete |
| subjects | Cross-disciplinary physics: materials science rheology Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | Effect of the Si wafer pretreatment on the patterned substrate morphology and growth of Hg1-xCdxTe PLD films |
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