Growth of SiNx and SiCx thin films by pulsed reactive crossed-beam laser ablation

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Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2000-03, Vol.70 (3), p.323-327
Hauptverfasser:	SPILLMANN, H, WILLMOTT, P. R
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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