$Demagnification in proximity x-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction$

Demagnification in proximity x-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction

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Bibliographische Detailangaben
Veröffentlicht in:	Journal of physics. D, Applied physics Applied physics, 1999-11, Vol.32 (22), p.L114-L118
Hauptverfasser:	Vladimirsky, Yuli, Bourdillon, Antony, Vladimirsky, Olga, Jiang, Wenlong, Leonard, Quinn
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Lithography, masks and pattern transfer Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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