Strength of silicon wafers: fracture mechanics approach

This paper describes a model to predict mechanical strength distribution of silicon wafers. A generalized expression, based on a multimodal Weibull distribution, is proposed to describe the strength of a brittle material with surface, edge, and bulk flaws. The specific case of a cast, unpolished pho...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:International journal of fracture 2009, Vol.155 (1), p.67-74
Hauptverfasser: Rupnowski, Przemyslaw, Sopori, Bhushan
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This paper describes a model to predict mechanical strength distribution of silicon wafers. A generalized expression, based on a multimodal Weibull distribution, is proposed to describe the strength of a brittle material with surface, edge, and bulk flaws. The specific case of a cast, unpolished photovoltaic (PV) wafer is further analyzed. Assuming that surface microcracks constitute the dominant mechanism of wafer breakage, this model predicts the strength distribution of PV silicon that matches well the experimental results available in the literature.
ISSN:0376-9429
1573-2673
DOI:10.1007/s10704-009-9324-9