Origin of atomic clusters during ion sputtering

Previous studies have shown that the size distributions of small clusters ( n < or = 40; n = number of atoms/cluster) generated by sputtering obey an inverse power law with an exponent between -8 and -4. Here we report electron microscopy studies of the size distributions of larger clusters ( n &...

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Veröffentlicht in:Physical review letters 2001-11, Vol.87 (20), p.207601-207601, Article 207601
Hauptverfasser: Rehn, L E, Birtcher, R C, Donnelly, S E, Baldo, P M, Funk, L
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Sprache:eng
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Zusammenfassung:Previous studies have shown that the size distributions of small clusters ( n < or = 40; n = number of atoms/cluster) generated by sputtering obey an inverse power law with an exponent between -8 and -4. Here we report electron microscopy studies of the size distributions of larger clusters ( n > or = 500) sputtered by high-energy ion impacts. These new measurements also yield an inverse power law, but one with an exponent of -2 and one independent of sputtering yield, indicating that the large clusters are produced when shock waves, generated by subsurface displacement cascades, ablate the surface.
ISSN:0031-9007
1079-7114
DOI:10.1103/physrevlett.87.207601