Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions

A strong influence of substrate crystallinity is observed for thin-film Co∕Ge reactions. For the detected phases (CoGe, Co5Ge7, and CoGe2), the formation temperatures on amorphous Ge (a-Ge) are found to be the lowest, while the highest are on single-crystalline Ge(100). Moreover, while the phase seq...

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Veröffentlicht in:Applied physics letters 2007-01, Vol.90 (3)
Hauptverfasser: Opsomer, K., Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lauwers, A., Maex, K., Lavoie, C.
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Sprache:eng
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Zusammenfassung:A strong influence of substrate crystallinity is observed for thin-film Co∕Ge reactions. For the detected phases (CoGe, Co5Ge7, and CoGe2), the formation temperatures on amorphous Ge (a-Ge) are found to be the lowest, while the highest are on single-crystalline Ge(100). Moreover, while the phase sequence on Ge(100) and polycrystalline Ge (poly-Ge) was unaltered, the formation of intermediate Co5Ge7 was not observed on a-Ge. It is likely that this is due to a promoted CoGe2 formation on a-Ge, resulting in a ∼200°C decrease in formation temperature (depending on the ramp rate). These observations suggest a strong competition among the formation of these Ge-rich phases.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2431781