Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions
A strong influence of substrate crystallinity is observed for thin-film Co∕Ge reactions. For the detected phases (CoGe, Co5Ge7, and CoGe2), the formation temperatures on amorphous Ge (a-Ge) are found to be the lowest, while the highest are on single-crystalline Ge(100). Moreover, while the phase seq...
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Veröffentlicht in: | Applied physics letters 2007-01, Vol.90 (3) |
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Sprache: | eng |
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Zusammenfassung: | A strong influence of substrate crystallinity is observed for thin-film Co∕Ge reactions. For the detected phases (CoGe, Co5Ge7, and CoGe2), the formation temperatures on amorphous Ge (a-Ge) are found to be the lowest, while the highest are on single-crystalline Ge(100). Moreover, while the phase sequence on Ge(100) and polycrystalline Ge (poly-Ge) was unaltered, the formation of intermediate Co5Ge7 was not observed on a-Ge. It is likely that this is due to a promoted CoGe2 formation on a-Ge, resulting in a ∼200°C decrease in formation temperature (depending on the ramp rate). These observations suggest a strong competition among the formation of these Ge-rich phases. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2431781 |