Experimental persistence probability for fluctuating steps
The persistence behavior for fluctuating steps on the Si(111)-(sqrt[3]xsqrt[3])R30 degrees -Al surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970 K. Using the standard persistence definition, the measured persistence probability displays power-law deca...
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Veröffentlicht in: | Physical review letters 2002-09, Vol.89 (13), p.136102-136102, Article 136102 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The persistence behavior for fluctuating steps on the Si(111)-(sqrt[3]xsqrt[3])R30 degrees -Al surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970 K. Using the standard persistence definition, the measured persistence probability displays power-law decay with an exponent of theta=0.77+/-0.03. This is consistent with the value of theta=3/4 predicted for attachment-detachment limited step kinetics. If the persistence analysis is carried out in terms of return to a fixed-reference position, the measured probability decays exponentially. Numerical studies of the Langevin equation used to model step motion corroborate the experimental observations. |
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ISSN: | 0031-9007 1079-7114 |
DOI: | 10.1103/PhysRevLett.89.136102 |