Experimental persistence probability for fluctuating steps

The persistence behavior for fluctuating steps on the Si(111)-(sqrt[3]xsqrt[3])R30 degrees -Al surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970 K. Using the standard persistence definition, the measured persistence probability displays power-law deca...

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Veröffentlicht in:Physical review letters 2002-09, Vol.89 (13), p.136102-136102, Article 136102
Hauptverfasser: Dougherty, D B, Lyubinetsky, I, Williams, E D, Constantin, M, Dasgupta, C, Das Sarma, S
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Sprache:eng
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Zusammenfassung:The persistence behavior for fluctuating steps on the Si(111)-(sqrt[3]xsqrt[3])R30 degrees -Al surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970 K. Using the standard persistence definition, the measured persistence probability displays power-law decay with an exponent of theta=0.77+/-0.03. This is consistent with the value of theta=3/4 predicted for attachment-detachment limited step kinetics. If the persistence analysis is carried out in terms of return to a fixed-reference position, the measured probability decays exponentially. Numerical studies of the Langevin equation used to model step motion corroborate the experimental observations.
ISSN:0031-9007
1079-7114
DOI:10.1103/PhysRevLett.89.136102