Thermodynamic and experimental study of the chemical vapor codeposition in the silicon-boron-carbon system at 1400 K

Thermodynamic and experimental study of the chemical vapor codeposition in the silicon-boron-carbon system at 1400 K

Thermodynamic calculations are in reasonable agreement with experimental results. Kinetic effects cause departures from equilibria that are accentuated at high flow rates. 48 refs.

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of the Electrochemical Society 1994-02, Vol.141 (2), p.452-461
Hauptverfasser: GOUJARD, S, VANDENBULCKE, L, BERNARD, C, BLONDIAUX, G, DEBRUN, J. L
Format: Artikel
Sprache:eng
Schlagworte:
360601 - Other Materials- Preparation & Manufacture
BORON
CARBON
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
COATINGS
COMPOSITE MATERIALS
CORROSION PROTECTION
Cross-disciplinary physics: materials science
rheology
DEPOSITION
ELEMENTS
Exact sciences and technology
HYDRIDES
HYDROGEN COMPOUNDS
MATERIALS
MATERIALS SCIENCE
Methods of deposition of films and coatings
film growth and epitaxy
NONMETALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
Physics
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SURFACE COATING
THERMODYNAMICS
VAPOR DEPOSITED COATINGS
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Thermodynamic calculations are in reasonable agreement with experimental results. Kinetic effects cause departures from equilibria that are accentuated at high flow rates. 48 refs.
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2054748