Fabrication and properties of Nb/Al, Al sub ox /Nb Josephson tunnel junctions with a double-oxide barrier

High-quality Nb/Al, Al{sub ox}/Nb Josephson tunnel junctions using double-oxide layers as barriers have been fabricated. The critical current density is controlled by the thickness of the second Al layer. This layer has to be oxidized completely through in order to obtain high-quality junctions. Typ...

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Veröffentlicht in:Journal of applied physics 1990-02, Vol.67:4
Hauptverfasser: Houwman, E.P., Veldhuis, D., Flokstra, J., Rogalla, H.
Format: Artikel
Sprache:eng
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Zusammenfassung:High-quality Nb/Al, Al{sub ox}/Nb Josephson tunnel junctions using double-oxide layers as barriers have been fabricated. The critical current density is controlled by the thickness of the second Al layer. This layer has to be oxidized completely through in order to obtain high-quality junctions. Typically, gap voltages of 2.8--3.0 mV and {ital V}{sub {ital m}} up to 70 mV at 4.2 K were obtained.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.345579