Rapid Chemical Vapor Deposition of Superconducting YBa sub 2 Cu sub 3 O sub x
A process has been developed that enables the rapid chemical vapor deposition of superconducting YBa sub 2 Cu sub 3 O sub x . In this process, a finely ground mixture of Y (tmhd) sub 3 , Ba(tmhd) sub 2 , and Cu(tmhd) sub 2 (tmhd = 2,2,6,6-tetramethyl-3,5-heptanedionate) is slowly fed, and pneumatica...
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| Veröffentlicht in: | Applied physics letters 1990-03, Vol.56 (12), p.1175-1177 |
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| container_title | Applied physics letters |
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| creator | Lackey, W J Carter, W B Hanigofsky, J A |
| description | A process has been developed that enables the rapid chemical vapor deposition of superconducting YBa sub 2 Cu sub 3 O sub x . In this process, a finely ground mixture of Y (tmhd) sub 3 , Ba(tmhd) sub 2 , and Cu(tmhd) sub 2 (tmhd = 2,2,6,6-tetramethyl-3,5-heptanedionate) is slowly fed, and pneumatically transported, directly into the chemical vapor deposition furnace. Because vaporizers are not used, the number of process parameters that must be controlled is greatly reduced. Deposition rates are at least an order of magnitude greater than those achieved by reagent sublimation. Films have been characterized by scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction, and resistance vs. temperature measurements. Films produced on planar MgO substrates have T sub c values that are significantly higher than previously reported for MgO. Diffraction patterns, Graphs. 24 ref.--AA |
| doi_str_mv | 10.1063/1.103330 |
| format | Article |
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In this process, a finely ground mixture of Y (tmhd) sub 3 , Ba(tmhd) sub 2 , and Cu(tmhd) sub 2 (tmhd = 2,2,6,6-tetramethyl-3,5-heptanedionate) is slowly fed, and pneumatically transported, directly into the chemical vapor deposition furnace. Because vaporizers are not used, the number of process parameters that must be controlled is greatly reduced. Deposition rates are at least an order of magnitude greater than those achieved by reagent sublimation. Films have been characterized by scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction, and resistance vs. temperature measurements. Films produced on planar MgO substrates have T sub c values that are significantly higher than previously reported for MgO. 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In this process, a finely ground mixture of Y (tmhd) sub 3 , Ba(tmhd) sub 2 , and Cu(tmhd) sub 2 (tmhd = 2,2,6,6-tetramethyl-3,5-heptanedionate) is slowly fed, and pneumatically transported, directly into the chemical vapor deposition furnace. Because vaporizers are not used, the number of process parameters that must be controlled is greatly reduced. Deposition rates are at least an order of magnitude greater than those achieved by reagent sublimation. Films have been characterized by scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction, and resistance vs. temperature measurements. Films produced on planar MgO substrates have T sub c values that are significantly higher than previously reported for MgO. Diffraction patterns, Graphs. 24 ref.--AA</description><subject>ALKALINE EARTH METAL COMPOUNDS</subject><subject>ANNEALING</subject><subject>BARIUM COMPOUNDS</subject><subject>BARIUM OXIDES</subject><subject>CHALCOGENIDES</subject><subject>CHEMICAL COATING</subject><subject>CHEMICAL VAPOR DEPOSITION</subject><subject>COPPER COMPOUNDS</subject><subject>COPPER OXIDES</subject><subject>DEPOSITION</subject><subject>HEAT TREATMENTS</subject><subject>MATERIALS SCIENCE</subject><subject>OXIDES</subject><subject>OXYGEN COMPOUNDS</subject><subject>PHYSICAL PROPERTIES</subject><subject>SUBSTRATES</subject><subject>SUPERCONDUCTING FILMS</subject><subject>SURFACE COATING</subject><subject>THERMODYNAMIC PROPERTIES</subject><subject>TRANSITION ELEMENT COMPOUNDS</subject><subject>TRANSITION TEMPERATURE</subject><subject>YTTRIUM COMPOUNDS 360201 -- Ceramics, Cermets, & Refractories-- Preparation & Fabrication</subject><subject>YTTRIUM OXIDES</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1990</creationdate><recordtype>article</recordtype><recordid>eNotjk1LxDAURYMoWEfBnxBcuKsmeW2aLrWOHzAy4IjgqrykqRPpNLVJwZ9vmXF17oXD5RJyydkNZxJu-QwAYEck4awoUuBcHZOEMQapLHN-Ss5C-J5rLgAS8vqGg2totbU7Z7CjHzj4kT7YwQcXne-pb-lmGuxofN9MJrr-i37eIw2TpoJW0z4AXe_5e05OWuyCvfjngmwel-_Vc7paP71Ud6vU50qlUhiuMoZSZrmVjGOhMYNWlGB1oyRCiVybVjMjc6a5KJVuCsmxBY0AChbk6rDqQ3R1MC5as53_9dbEWpZCZiBm6fogDaP_mWyI9c4FY7sOe-unUIusLHImFfwBWl5YpQ</recordid><startdate>19900319</startdate><enddate>19900319</enddate><creator>Lackey, W J</creator><creator>Carter, W B</creator><creator>Hanigofsky, J A</creator><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope><scope>OTOTI</scope></search><sort><creationdate>19900319</creationdate><title>Rapid Chemical Vapor Deposition of Superconducting YBa sub 2 Cu sub 3 O sub x</title><author>Lackey, W J ; Carter, W B ; Hanigofsky, J A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o588-62c1840a6645e601a7ba43f293ebd86a39a1bcfb0c650b1298bd761af3ba3383</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1990</creationdate><topic>ALKALINE EARTH METAL COMPOUNDS</topic><topic>ANNEALING</topic><topic>BARIUM COMPOUNDS</topic><topic>BARIUM OXIDES</topic><topic>CHALCOGENIDES</topic><topic>CHEMICAL COATING</topic><topic>CHEMICAL VAPOR DEPOSITION</topic><topic>COPPER COMPOUNDS</topic><topic>COPPER OXIDES</topic><topic>DEPOSITION</topic><topic>HEAT TREATMENTS</topic><topic>MATERIALS SCIENCE</topic><topic>OXIDES</topic><topic>OXYGEN COMPOUNDS</topic><topic>PHYSICAL PROPERTIES</topic><topic>SUBSTRATES</topic><topic>SUPERCONDUCTING FILMS</topic><topic>SURFACE COATING</topic><topic>THERMODYNAMIC PROPERTIES</topic><topic>TRANSITION ELEMENT COMPOUNDS</topic><topic>TRANSITION TEMPERATURE</topic><topic>YTTRIUM COMPOUNDS 360201 -- Ceramics, Cermets, & Refractories-- Preparation & Fabrication</topic><topic>YTTRIUM OXIDES</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lackey, W J</creatorcontrib><creatorcontrib>Carter, W B</creatorcontrib><creatorcontrib>Hanigofsky, J A</creatorcontrib><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>OSTI.GOV</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lackey, W J</au><au>Carter, W B</au><au>Hanigofsky, J A</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Rapid Chemical Vapor Deposition of Superconducting YBa sub 2 Cu sub 3 O sub x</atitle><jtitle>Applied physics letters</jtitle><date>1990-03-19</date><risdate>1990</risdate><volume>56</volume><issue>12</issue><spage>1175</spage><epage>1177</epage><pages>1175-1177</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>A process has been developed that enables the rapid chemical vapor deposition of superconducting YBa sub 2 Cu sub 3 O sub x . In this process, a finely ground mixture of Y (tmhd) sub 3 , Ba(tmhd) sub 2 , and Cu(tmhd) sub 2 (tmhd = 2,2,6,6-tetramethyl-3,5-heptanedionate) is slowly fed, and pneumatically transported, directly into the chemical vapor deposition furnace. Because vaporizers are not used, the number of process parameters that must be controlled is greatly reduced. Deposition rates are at least an order of magnitude greater than those achieved by reagent sublimation. Films have been characterized by scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction, and resistance vs. temperature measurements. Films produced on planar MgO substrates have T sub c values that are significantly higher than previously reported for MgO. Diffraction patterns, Graphs. 24 ref.--AA</abstract><cop>United States</cop><doi>10.1063/1.103330</doi><tpages>3</tpages></addata></record> |
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| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 1990-03, Vol.56 (12), p.1175-1177 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_osti_scitechconnect_6926432 |
| source | AIP Digital Archive |
| subjects | ALKALINE EARTH METAL COMPOUNDS ANNEALING BARIUM COMPOUNDS BARIUM OXIDES CHALCOGENIDES CHEMICAL COATING CHEMICAL VAPOR DEPOSITION COPPER COMPOUNDS COPPER OXIDES DEPOSITION HEAT TREATMENTS MATERIALS SCIENCE OXIDES OXYGEN COMPOUNDS PHYSICAL PROPERTIES SUBSTRATES SUPERCONDUCTING FILMS SURFACE COATING THERMODYNAMIC PROPERTIES TRANSITION ELEMENT COMPOUNDS TRANSITION TEMPERATURE YTTRIUM COMPOUNDS 360201 -- Ceramics, Cermets, & Refractories-- Preparation & Fabrication YTTRIUM OXIDES |
| title | Rapid Chemical Vapor Deposition of Superconducting YBa sub 2 Cu sub 3 O sub x |
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