Rapid Chemical Vapor Deposition of Superconducting YBa sub 2 Cu sub 3 O sub x

A process has been developed that enables the rapid chemical vapor deposition of superconducting YBa sub 2 Cu sub 3 O sub x . In this process, a finely ground mixture of Y (tmhd) sub 3 , Ba(tmhd) sub 2 , and Cu(tmhd) sub 2 (tmhd = 2,2,6,6-tetramethyl-3,5-heptanedionate) is slowly fed, and pneumatically transported, directly into the chemical vapor deposition furnace. Because vaporizers are not used, the number of process parameters that must be controlled is greatly reduced. Deposition rates are at least an order of magnitude greater than those achieved by reagent sublimation. Films have been characterized by scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction, and resistance vs. temperature measurements. Films produced on planar MgO substrates have T sub c values that are significantly higher than previously reported for MgO. Diffraction patterns, Graphs. 24 ref.--AA