Structure of SiO[sub 2] on Al[sub 2]O[sub 3] monolayer catalysts: Investigation by infrared spectroscopy and [sup 29]Si MAS NMR

Infrared spectroscopy and [sup 29]Si MAS NMR are used to probe the structure of SiO[sub 2] on Al[sub 2]O[sub 3] catalysts prepared by chemical vapor deposition of Si(OCH[sub 3])[sub 4][center dot]SiO[sub 2] loadings from about 0.2-2.5 statistical monolayers are studied. Infrared shows a gradual disappearance of AlOH vibrations as the SiO[sub 2] loading is increased. A population of inaccessible AlOH is also observed. The Si-O-X asymmetric stretching frequency shows a continuous variation with SiO[sub 2] content, consistent with X varying from Al at low levels to Si at high levels of silica. [sup 29]Si NMR shows composite peaks at all SiO[sub 2] levels. At the lowest level most intensity is concentrated in the -80 to -85 ppm range, corresponding to Si with attached -OAl groups. At the highest silica levels, the spectrum can be deconvoluted into peaks at -108, -100, and -92 ppm. These correspond to Si(OSi)[sub 4], Si(OSi)[sub 3]OH, and mixtures of Si(OSi)[sub 2](OH)[sub 2] with -OAl-containing species. A model is proposed for build up of the silica layer on these catalysts. Random deposition of silica on any available surface is shown to give a semiquantitative account of the experimental results. 31 refs., 6 fig., 2 tabs.