Laser-induced micron size clustering in thiophenol vapor

Positively charged micron sized clusters are efficiently produced following irradiation of thiophenol vapor at 248 nm by a single KrF laser pulse of 30 ns duration. The production mechanism has been studied by examining the effect of N2, Ar, and He as diffusion media in mixtures with thiophenol, and...

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Veröffentlicht in:The Journal of chemical physics 1993-03, Vol.98 (6), p.5079-5086
Hauptverfasser: ZAFIROPULOS, V, KOLLIA, Z, FOTAKIS, C, STOCKDALE, J. A. D
Format: Artikel
Sprache:eng
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Zusammenfassung:Positively charged micron sized clusters are efficiently produced following irradiation of thiophenol vapor at 248 nm by a single KrF laser pulse of 30 ns duration. The production mechanism has been studied by examining the effect of N2, Ar, and He as diffusion media in mixtures with thiophenol, and by varying the laser pulse energy and excitation wavelength. A qualitative summary of possible mechanisms that may be responsible for the experimental results is presented providing a framework for understanding the observed cluster growth. The measurements indicate an optimum set of parameters for growth of large clusters and also show that the cluster charge can be controlled by selection of the buffer gas mixture.
ISSN:0021-9606
1089-7690
DOI:10.1063/1.464963