Experimental Whisker Growth and Thermodynamic Study of the Hafnium-Carbon System for Chemical Vapor Deposition Applications

Chemical vapor deposition of nonstoichiometric hafnium carbide is studied by computer minimization of the Gibbs free energy of the system. Isostoichiometric curves in the HfC1‐x region of the deposition diagram are calculated as a function of HfCI4, CH4, and H2 concentration and reaction temperature...

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Veröffentlicht in:Journal of the American Ceramic Society 1990-06, Vol.73 (6), p.1593-1598
Hauptverfasser: Lackey, W. J., Hanigofsky, John A., Freeman, Garth B.
Format: Artikel
Sprache:eng
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Zusammenfassung:Chemical vapor deposition of nonstoichiometric hafnium carbide is studied by computer minimization of the Gibbs free energy of the system. Isostoichiometric curves in the HfC1‐x region of the deposition diagram are calculated as a function of HfCI4, CH4, and H2 concentration and reaction temperature. Possible experimental reactions are investigated using thermodynamic efficiency and partial pressure diagrams. A comparison between the calculated solid‐phase regions and the HfC phase diagram is given, and experimental results for HfC whiskers are also compared with the calculations.
ISSN:0002-7820
1551-2916
DOI:10.1111/j.1151-2916.1990.tb09801.x