A NEXAFS study of thin polyacrylonitrile films electrochemically deposited on Ni : the effect of the film thickness and annealing treatment

Polyacrylonitrile (PAN) thin films electrochemically deposited on Ni have been studied by near edge x‐ray absorption fine structure, as a function of the film thickness and annealing treatment. For 20Å thick films, the polymer chains are oriented perpendicular to the surface with the C≡N groups para...

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Veröffentlicht in:Journal of the Electrochemical Society 1990-08, Vol.137 (8), p.2499-2501
Hauptverfasser: TOURILLON, G, GARRETT, R, LAZARZ, N, RAYNAUD, M, REYNAUD, C, LECAYON, G, VIEL, P
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Sprache:eng
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Zusammenfassung:Polyacrylonitrile (PAN) thin films electrochemically deposited on Ni have been studied by near edge x‐ray absorption fine structure, as a function of the film thickness and annealing treatment. For 20Å thick films, the polymer chains are oriented perpendicular to the surface with the C≡N groups parallel to it. Below a few angstroms, no polymerization occurs but molecules are adsorbed perpendicular to the surface. Annealing at 300°C results in the loss of the majority part of the N content of the film in contrast with the admitted mechanism for bulk PAN.
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2086975