Can electrical deactivation of highly Si-doped GaAs be explained by autocompensation ?

Using near-edge x-ray absorption fine structure, the first experimental determination of Si atom concentrations occupying As sites in Si-doped GaAs (100) is reported. The measurements reveal that at high doping levels (≳1019 cm−3) in molecular-beam-epitaxy-grown samples, the number of such p-type Si...

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Veröffentlicht in:Applied physics letters 1993-10, Vol.63 (17), p.2357-2359
Hauptverfasser: SCHUPPLER, S, ADLER, D. L, PFEIFFER, L. N, WEST, K. W, CHABAN, E. E, CITRIN, P. H
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Sprache:eng
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Zusammenfassung:Using near-edge x-ray absorption fine structure, the first experimental determination of Si atom concentrations occupying As sites in Si-doped GaAs (100) is reported. The measurements reveal that at high doping levels (≳1019 cm−3) in molecular-beam-epitaxy-grown samples, the number of such p-type Si atoms is insufficient to account for the observed large reduction of free-carriers.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.110500