Can electrical deactivation of highly Si-doped GaAs be explained by autocompensation ?
Using near-edge x-ray absorption fine structure, the first experimental determination of Si atom concentrations occupying As sites in Si-doped GaAs (100) is reported. The measurements reveal that at high doping levels (≳1019 cm−3) in molecular-beam-epitaxy-grown samples, the number of such p-type Si...
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Veröffentlicht in: | Applied physics letters 1993-10, Vol.63 (17), p.2357-2359 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Using near-edge x-ray absorption fine structure, the first experimental determination of Si atom concentrations occupying As sites in Si-doped GaAs (100) is reported. The measurements reveal that at high doping levels (≳1019 cm−3) in molecular-beam-epitaxy-grown samples, the number of such p-type Si atoms is insufficient to account for the observed large reduction of free-carriers. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.110500 |