Conductivity-type inversion following low-energy hydrogen implantation

A surface conductivity-type inversion has been observed following low-energy (400 eV), high-dose, hydrogen implantation of p-type silicon. Detailed structural, chemical, and electrical examination of the surface revealed that the inversion resulted from hydrogen forming n-type complexes with extende...

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Veröffentlicht in:Applied physics letters 1991-05, Vol.58 (18), p.1985-1987
Hauptverfasser: TIAN-QUN ZHOU, RADZIMSKI, Z, PATNAIK, B, ROZGONYI, G. A, SOPORI, B
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Sprache:eng
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Zusammenfassung:A surface conductivity-type inversion has been observed following low-energy (400 eV), high-dose, hydrogen implantation of p-type silicon. Detailed structural, chemical, and electrical examination of the surface revealed that the inversion resulted from hydrogen forming n-type complexes with extended defects.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.105040