Conductivity-type inversion following low-energy hydrogen implantation
A surface conductivity-type inversion has been observed following low-energy (400 eV), high-dose, hydrogen implantation of p-type silicon. Detailed structural, chemical, and electrical examination of the surface revealed that the inversion resulted from hydrogen forming n-type complexes with extende...
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Veröffentlicht in: | Applied physics letters 1991-05, Vol.58 (18), p.1985-1987 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A surface conductivity-type inversion has been observed following low-energy (400 eV), high-dose, hydrogen implantation of p-type silicon. Detailed structural, chemical, and electrical examination of the surface revealed that the inversion resulted from hydrogen forming n-type complexes with extended defects. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.105040 |