Complete wetting of a rough surface : an X-ray study

The evolution of the surface structure of a wetting film on a rough surface as a function of the film thickness has been studied by x-ray specular reflection and surface diffusion scattering. For thin films ({approx lt}60 A) the liquid surface is characterized by static undulations induced by the ro...

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Veröffentlicht in:	Physical review letters 1991-04, Vol.66 (16), p.2108-2111
Hauptverfasser:	TIDSWELL, I. M, RABEDEAU, T. A, PERSHAN, P. S, KOSOWSKY, S. D
Format:	Artikel
Sprache:	eng
Schlagworte:	360602 - Other Materials- Structure & Phase Studies ALKANES COHERENT SCATTERING Condensed matter: structure, mechanical and thermal properties CRYSTAL STRUCTURE CYCLOALKANES CYCLOHEXANE DATA DIFFRACTION DIMENSIONS Exact sciences and technology EXPERIMENTAL DATA FLUIDS GASES HYDROCARBONS INFORMATION INTERFACES LIQUIDS MATERIALS SCIENCE NUMERICAL DATA ORGANIC COMPOUNDS Physics ROUGHNESS SCATTERING Structure of solids and liquids crystallography Studies of specific liquid structures SUBSTRATES SURFACE PROPERTIES SURFACES THICKNESS THIN FILMS VAN DER WAALS FORCES VAPORS VARIATIONS WETTABILITY X-RAY DIFFRACTION
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Zusammenfassung:	The evolution of the surface structure of a wetting film on a rough surface as a function of the film thickness has been studied by x-ray specular reflection and surface diffusion scattering. For thin films ({approx lt}60 A) the liquid surface is characterized by static undulations induced by the roughness of the substrate; however, with increasing film thickness the structure is dominated by thermally induced capillary waves. The data are quantitatively described by a model with exclusively van der Waals liquid-substrate interactions.
ISSN:	0031-9007 1079-7114
DOI:	10.1103/physrevlett.66.2108