Design and verification of nearly ideal flow and heat transfer in a rotating disk chemical vapor deposition reactor

A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under...

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Veröffentlicht in:Journal of the Electrochemical Society 1991-06, Vol.138 (6), p.1806-1816
Hauptverfasser: BREILAND, W. G, EVANS, G. H
Format: Artikel
Sprache:eng
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Zusammenfassung:A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under both isothermal and heated-disk conditions, and gas temperatures are addressed with both one- and two-dimensional numerical fluid mechanics models. In this paper experimental verification of the design using flow visualization and laser Raman thermometry are presented.
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2085878