Design and verification of nearly ideal flow and heat transfer in a rotating disk chemical vapor deposition reactor
A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under...
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Veröffentlicht in: | Journal of the Electrochemical Society 1991-06, Vol.138 (6), p.1806-1816 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under both isothermal and heated-disk conditions, and gas temperatures are addressed with both one- and two-dimensional numerical fluid mechanics models. In this paper experimental verification of the design using flow visualization and laser Raman thermometry are presented. |
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ISSN: | 0013-4651 1945-7111 |
DOI: | 10.1149/1.2085878 |