Equipment simulation of selective tungsten deposition

The numerical modeling of a cold wall reactor for selective tungsten chemical vapor deposition is presented. In a two-dimensional simulation the mass and heat transfer equations were solved considering the five chemical species H sub 2 , WF sub 6 , HF, WF sub x , SiF sub y . Detailed models for mult...

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Veröffentlicht in:Journal of the Electrochemical Society 1992-02, Vol.139 (2), p.566-574
Hauptverfasser: WERNER, C, ULACIA, J. I, HOPFMANN, C, FLYNN, P
Format: Artikel
Sprache:eng
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Zusammenfassung:The numerical modeling of a cold wall reactor for selective tungsten chemical vapor deposition is presented. In a two-dimensional simulation the mass and heat transfer equations were solved considering the five chemical species H sub 2 , WF sub 6 , HF, WF sub x , SiF sub y . Detailed models for multicomponent diffusion and for the autocatalytic tungsten nucleation process were implemented. Model results are in good agreement with experimental findings. The simulations are used to study the impact of reactor design on selectivity.
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2069259