Anomalous behavior of ion-implanted GaSb

Anomalous elevations up to 6 μm of the ion-implanted GaSb surface were observed. This swelling phenomenon is related to the formation of a porous layer and is dependent on the mass, energy, and dose of the implanted ions. A strong amount of oxygen was measured in the porous layers but this oxygen is...

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Veröffentlicht in:Applied physics letters 1991-10, Vol.59 (15), p.1872-1874
Hauptverfasser: CALLEC, R, FAVENNEC, P. N, SALVI, M, L'HARIDON, H, GAUNEAU, M
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Sprache:eng
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Zusammenfassung:Anomalous elevations up to 6 μm of the ion-implanted GaSb surface were observed. This swelling phenomenon is related to the formation of a porous layer and is dependent on the mass, energy, and dose of the implanted ions. A strong amount of oxygen was measured in the porous layers but this oxygen is likely not responsible for the swelling. The behavior of implanted GaSb is very similar to that of InSb previously described.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.106173