Plasma nitridation process for superconducting Nb wiring to improve their annealing stability

Plasma nitridation process for superconducting Nb wiring to improve their annealing stability

We developed plasma nitridation for superconducting Nb wiring to improve their annealing stability. Plasma nitridation was observed to be very effective in increasing the critical currents and improve annealing stability. We analyzed the nitride layer formed on the surface of Nb film by plasma nitri...

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Veröffentlicht in:Journal of applied physics 1991-12, Vol.70 (11), p.6958-6965
Hauptverfasser: Shiota, Tetsuyoshi, Imamura, Takeshi, Hasuo, Shinya
Format: Artikel
Sprache:eng
Schlagworte:
360104 - Metals & Alloys- Physical Properties
ANNEALING
CHEMICAL REACTIONS
DIFFUSION BARRIERS
ELEMENTS
HEAT TREATMENTS
JOSEPHSON JUNCTIONS
JUNCTIONS
MATERIALS SCIENCE
METALS
NIOBIUM
NITRIDATION
PLASMA
STABILITY
SUPERCONDUCTING FILMS
SUPERCONDUCTING JUNCTIONS
TRANSITION ELEMENTS
WIRES
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Zusammenfassung:We developed plasma nitridation for superconducting Nb wiring to improve their annealing stability. Plasma nitridation was observed to be very effective in increasing the critical currents and improve annealing stability. We analyzed the nitride layer formed on the surface of Nb film by plasma nitridation, and found that it prevented oxygen diffusion in Nb. Plasma nitridation is a currently feasible process to improve the reliability of Nb wiring in Josephson circuit.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.349823