Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond

Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond

The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p -type diamond (the concentration ~10 20 cm –3 ) in CH 4 + Ar plasma is conducted. The deposition rate is 7 nm min –1 . The elemental composition and properties of the films are studied in deta...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2019-09, Vol.53 (9), p.1203-1206
Hauptverfasser: Okhapkin, A. I., Yunin, P. A., Drozdov, M. N., Korolyov, S. A., Kraev, S. A., Arkhipova, E. A., Skorokhodov, E. V., Bushuykin, P. A., Shashkin, V. I.
Format: Artikel
Sprache:eng
Schlagworte:
2019
ARGON
BORON
CHEMICAL VAPOR DEPOSITION
CONCENTRATION RATIO
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DENSITY
DEPOSITION
Diamond-like carbon films
DIAMONDS
DOPED MATERIALS
HYDROGEN
Magnetic Materials
Magnetism
March 11–14
METHANE
MONOCRYSTALS
Nizhny Novgorod
Organic chemistry
Physics
Physics and Astronomy
PLASMA
ROUGHNESS
Single crystals
SURFACES
THIN FILMS
Xxiii International Symposium “Nanophysics and Nanoelectronics”
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p -type diamond (the concentration ~10 20 cm –3 ) in CH 4 + Ar plasma is conducted. The deposition rate is 7 nm min –1 . The elemental composition and properties of the films are studied in detail. It is found that the films are enriched with hydrogen, possess a density of 2.4 g cm –3 , and exhibit an ultrasmooth surface (with a roughness of 0.4 ± 0.2 nm).
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782619090136