Specific Features of the Luminescence of ZnO:Te/GaN/Al{sub 2}O{sub 3} Heterostructures

High-quality heteroepitaxial (0001)ZnO:Te/(0001)GaN/(0001)Al{sub 2}O{sub 3} structures have been grown by hydrogen vapor-phase epitaxy in a low-pressure continuous flow reactor. X-ray diffraction analysis of these heterostructures has been carried out, which revealed the high structural quality of t...

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Veröffentlicht in:Technical physics letters 2018-12, Vol.44 (12)
Hauptverfasser: Bagamadova, A. M., Asvarov, A. Sh, Omaev, A. K., Zobov, M. E.
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Sprache:eng
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Zusammenfassung:High-quality heteroepitaxial (0001)ZnO:Te/(0001)GaN/(0001)Al{sub 2}O{sub 3} structures have been grown by hydrogen vapor-phase epitaxy in a low-pressure continuous flow reactor. X-ray diffraction analysis of these heterostructures has been carried out, which revealed the high structural quality of thin zinc oxide layers. The surface morphology and specific features of UV photoluminescence of the ZnO/GaN/Al{sub 2}O{sub 3} heterostructure have been analyzed.
ISSN:1063-7850
1090-6533