Effect of the Structural Quality of Quantum-Well Layers of Gallium-Nitride Heterostructures on Their Radiative Characteristics

The structural quality of GaN/GaInN/Al 2 O 3 heterostructure layers and effect of their imperfection on the characteristics of emitters based on them are investigated. The layer imperfection is established by X-ray diffractometry. A new technique and an FD-24K photodiode-based device for determining...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2017-12, Vol.51 (13), p.1681-1685
Hauptverfasser: Vigdorovich, E. N., Ermoshin, I. G.
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Ermoshin, I. G.
description The structural quality of GaN/GaInN/Al 2 O 3 heterostructure layers and effect of their imperfection on the characteristics of emitters based on them are investigated. The layer imperfection is established by X-ray diffractometry. A new technique and an FD-24K photodiode-based device for determining the quantum yield are developed.
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subjects ALUMINIUM OXIDES
Aluminum oxide
DISLOCATIONS
Emitters
Epitaxy
Gallium nitrate
GALLIUM NITRIDES
Heterostructures
Magnetic Materials
Magnetism
Materials for Electronic Engineering
MATERIALS SCIENCE
Nitrides
Physics
Physics and Astronomy
QUANTUM WELLS
X-RAY DIFFRACTION
title Effect of the Structural Quality of Quantum-Well Layers of Gallium-Nitride Heterostructures on Their Radiative Characteristics
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