Chemical mixing at “Al on Fe” and “Fe on Al” interfaces

Chemical mixing at “Al on Fe” and “Fe on Al” interfaces

The chemical mixing at the “Al on Fe” and “Fe on Al” interfaces was studied by molecular dynamics simulations of the layer growth and by 57Fe Mössbauer spectroscopy. The concentration distribution along the layer growth direction was calculated for different crystallographic orientations, and atomic...

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Veröffentlicht in:Journal of applied physics 2015-10, Vol.118 (13)
Hauptverfasser: Süle, P., Kaptás, D., Bujdosó, L., Horváth, Z. E., Nakanishi, A., Balogh, J.
Format: Artikel
Sprache:eng
Schlagworte:
Aluminum
Applied physics
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
Computer simulation
CRYSTALLOGRAPHY
DISTRIBUTION
INTERFACES
Iron
IRON 57
Mathematical analysis
MIXING
Molecular dynamics
MOLECULAR DYNAMICS METHOD
Mossbauer spectroscopy
Organic chemistry
Silicon substrates
SIMULATION
SPECTROSCOPY
SUBSTRATES
VACUUM EVAPORATION
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Zusammenfassung:The chemical mixing at the “Al on Fe” and “Fe on Al” interfaces was studied by molecular dynamics simulations of the layer growth and by 57Fe Mössbauer spectroscopy. The concentration distribution along the layer growth direction was calculated for different crystallographic orientations, and atomically sharp “Al on Fe” interfaces were found when Al grows over (001) and (110) oriented Fe layers. The Al/Fe(111) interface is also narrow as compared to the intermixing found at the “Fe on Al” interfaces for any orientation. Conversion electron Mössbauer measurements of trilayers—Al/57Fe/Al and Al/57Fe/Ag grown simultaneously over Si(111) substrate by vacuum evaporation—support the results of the molecular dynamics calculations.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4932521