Substrate temperature control for the formation of metal nanohelices by glancing angle deposition

The targets of this study are to develop a device to precisely control the temperature during glancing angle deposition, to make films consisting of low melting temperature metal nanoelements with a controlled shape (helix), and to explore the substrate temperature for controlling the nanoshapes. A vacuum evaporation system capable of both cooling a substrate and measurement of its temperature was used to form thin films consisting of arrays of Cu and Al nanohelices on silicon substrates by maintaining the substrate temperature at Ts/Tm