Structural, optical and waveguiding properties improvement of SiO{sub 2}/TiO{sub 2} Bragg reflectors processed by the sol–gel method under the effect of Ni-doped TiO{sub 2} and annealing duration

Highlights: • The formation of anatase phase only, whatever are Ni content and annealing duration. • Transmission and PL spectra redshifted with Ni content and annealing duration. • PL lowering with Ni content is due to the recombination rate of electron–hole reduction. • Annealing duration increase...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials research bulletin 2014-09, Vol.57
Hauptverfasser: Sedrati, H., Bensaha, R., Bensouyad, H., Miska, P., Robert, S.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Highlights: • The formation of anatase phase only, whatever are Ni content and annealing duration. • Transmission and PL spectra redshifted with Ni content and annealing duration. • PL lowering with Ni content is due to the recombination rate of electron–hole reduction. • Annealing duration increases the recombination rate and then the PL intensity rises. • Increasing Ni content improves waveguiding properties and then two TE modes appear. - Abstract: We investigated the nickel doped TiO{sub 2} layer and annealing duration effects on SiO{sub 2}/TiO{sub 2} Bragg reflectors. The films crystallize in pure anatase phase whatever is the Ni content and the annealing duration. In UV–vis-NIR analyses, variations of width, position and transmission coefficient of the stop-band were observed. The PL spectra red-shifted when the Ni content and annealing duration increased. As the annealing duration increases, an additional sharp emission peak appears around 867 nm, indicating a reduced number of defects. As Ni content increased, the M-lines spectroscopy shows two transverse electric polarization guided modes TE{sub 0} and TE{sub 1}, which indicates a decreased refractive index and an increased film thickness.
ISSN:0025-5408
1873-4227
DOI:10.1016/J.MATERRESBULL.2014.06.015