Power dependence of electron density at various pressures in inductively coupled plasmas

Experimental observation of the electron density variation in inductively coupled plasmas with the electron energy probability function (EEPFs) was performed at various gas pressures at two RF powers (25 W and 200 W). The measured EEPFs at high power discharges (200 W) showed a Maxwellian distributi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Physics of plasmas 2014-11, Vol.21 (11)
Hauptverfasser: Kim, June Young, Kim, Dong-Hwan, Kim, Ju Ho, Jeon, Sang-Bum, Cho, Sung-Won, Chung, Chin-Wook
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Experimental observation of the electron density variation in inductively coupled plasmas with the electron energy probability function (EEPFs) was performed at various gas pressures at two RF powers (25 W and 200 W). The measured EEPFs at high power discharges (200 W) showed a Maxwellian distribution, while evolution of the EEPFs from a bi-Maxwellian distribution to a Druyvesteyn-like distribution was observed at low RF powers (25 W) with increasing pressure. A discrepancy of the electron density variation between the two RF powers was observed. This difference is explained by the modified collisional loss and the Bohm velocity from the EEPF of the bi-Maxwellian distribution and the Druyvesteyn–like distribution.
ISSN:1070-664X
1089-7674
DOI:10.1063/1.4901305