Protection of MoO{sub 3} high work function by organic thin film

Protection of MoO{sub 3} high work function by organic thin film

The effects of air exposure are investigated for molybdenum trioxide (MoO{sub 3}) covered with organic thin films using ultraviolet photoemission spectroscopy. It is found that the severe drop of the work function of MoO{sub 3} by air exposure is substantially reduced by the organic thin films. Both...

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Veröffentlicht in:Applied physics letters 2014-11, Vol.105 (18)
Hauptverfasser: Wang, Chenggong, Irfan, Irfan, Gao, Yongli, Institute for Super-microstructure and Ultrafast Process in Advanced Materials
Format: Artikel
Sprache:eng
Schlagworte:
COPPER COMPLEXES
FULLERENES
INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY
MOLYBDENUM OXIDES
PHOTOELECTRON SPECTROSCOPY
PHTHALOCYANINES
THIN FILMS
ULTRAVIOLET SPECTRA
WORK FUNCTIONS
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Beschreibung
Zusammenfassung:The effects of air exposure are investigated for molybdenum trioxide (MoO{sub 3}) covered with organic thin films using ultraviolet photoemission spectroscopy. It is found that the severe drop of the work function of MoO{sub 3} by air exposure is substantially reduced by the organic thin films. Both CuPc and C{sub 60} are used for the investigations. The results indicate that the MoO{sub 3} surface can be passivated by approximately two monolayers of organic thin films against exposure to air.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4901164