Effects of ZrO{sub 2} doping on HfO{sub 2} resistive switching memory characteristics

A resistive switching (RS) random access memory device with ZrO{sub 2}-doped HfO{sub 2} exhibits better RS performance than that with pure HfO{sub 2}. In particular, I{sub res}, V{sub res}, and V{sub set} are reduced by approximately 58%, 38%, and 39%, respectively, when HfO{sub 2} is doped with ZrO{sub 2} (9 at. %). In addition, the ZrO{sub 2} doping in HfO{sub 2} makes the distribution of most parameters steeper. Transmission electron microscopy (TEM) analysis reveals that the deposited zirconium-doped hafnium oxide (HZO) (9 at. %) is polycrystalline. Elemental mapping results by scanning TEM–energy dispersive spectroscopy also prove that ZrO{sub 2} is uniformly distributed in the HZO (9 at. %) film. The possible mechanism for the improvement in the RS characteristics is also suggested on the basis of the X-ray photoelectron spectroscopy results and filamentary RS mechanism. These results suggest that the ZrO{sub 2} doping into HfO{sub 2} likely not only will reduce power consumption but also will improve cyclic endurance by controlling the nonstoichiometric phase.