Surface characterization of silica glass substrates treated by atomic hydrogen

Silica glass substrates with very flat surfaces were exposed to atomic hydrogen at different temperatures and durations. An atomic force microscope was used to measure root-mean-square (RMS) roughness and two-dimensional power spectral density (PSD). In the treatment with atomic hydrogen up to 900°C...

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Veröffentlicht in:	Materials characterization 2013-12, Vol.86, p.283-289
Hauptverfasser:	Inoue, Hiroyuki, Masuno, Atsunobu, Ishibashi, Keiji, Tawarayama, Hiromasa, Zhang, Yingjiu, Utsuno, Futoshi, Koya, Kazuo, Fujinoki, Akira, Kawazoe, Hiroshi
Format:	Artikel
Sprache:	eng
Schlagworte:	ATOMIC FORCE MICROSCOPY Cross-disciplinary physics: materials science rheology ETCHING Exact sciences and technology Heat treatment HEAT TREATMENTS HYDROGEN MATERIALS SCIENCE OH group Phase diagrams and microstructures developed by solidification and solid-solid phase transformations Physics Power spectral density ROUGHNESS SILICA Solidification SPECTRAL DENSITY SUBSTRATES Surface roughness
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