λ/26 silver nanodots fabricated by direct laser writing through highly sensitive two-photon photoreduction

We demonstrated an approach to break the diffraction limit and realise deep-subwavelength two-photon direct laser writing by employing a highly sensitive photoreduction process. The photoreduction photosensitivity increased by at least 4 times while the wavelength of the fabrication laser beam was t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2013-11, Vol.103 (21)
Hauptverfasser: Cao, Yaoyu, Gu, Min
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We demonstrated an approach to break the diffraction limit and realise deep-subwavelength two-photon direct laser writing by employing a highly sensitive photoreduction process. The photoreduction photosensitivity increased by at least 4 times while the wavelength of the fabrication laser beam was tuned from 800 nm to 580 nm. The increase of the photosensitivity resulted in improved resolution for the silver dot fabrication. By developing the photoreduction material with adding electron donors, the photosensitivity further increased and enabled the realisation of a single silver dot at 22 nm which is λ/26 for the wavelength of the fabrication laser beam.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4830221