The electron-phonon relaxation time in thin superconducting titanium nitride films

We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 i...

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Veröffentlicht in:Applied physics letters 2013-12, Vol.103 (25)
Hauptverfasser: Kardakova, A., Finkel, M., Morozov, D., Kovalyuk, V., An, P., Dunscombe, C., Tarkhov, M., Mauskopf, P., Klapwijk, T. M., Goltsman, G.
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container_issue 25
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container_title Applied physics letters
container_volume 103
creator Kardakova, A.
Finkel, M.
Morozov, D.
Kovalyuk, V.
An, P.
Dunscombe, C.
Tarkhov, M.
Mauskopf, P.
Klapwijk, T. M.
Goltsman, G.
description We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.
doi_str_mv 10.1063/1.4851235
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source AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection
subjects Applied physics
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Detectors
ELECTRONS
FERMI LEVEL
Parameter estimation
PHONONS
RELAXATION TIME
Superconductivity
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE
Thin films
TITANIUM
Titanium nitride
TITANIUM NITRIDES
title The electron-phonon relaxation time in thin superconducting titanium nitride films
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