Effect of substrate temperature on the magnetic properties of epitaxial sputter-grown Co/Pt

Epitaxial Co/Pt films have been deposited by dc-magnetron sputtering onto heated C-plane sapphire substrates. X-ray diffraction, the residual resistivity, and transmission electron microscopy indicate that the Co/Pt films are highly ordered on the atomic scale. The coercive field and the perpendicul...

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Veröffentlicht in:	Applied physics letters 2013-12, Vol.103 (26)
Hauptverfasser:	Mihai, A. P., Whiteside, A. L., Canwell, E. J., Marrows, C. H., Benitez, M. J., McGrouther, D., McVitie, S., McFadzean, S., Moore, T. A.
Format:	Artikel
Sprache:	eng
Schlagworte:	ANISOTROPY Applied physics Cobalt Coercive force Coercivity CREEP Creep (materials) DEPOSITION DEPOSITS Diffraction Domain walls Epitaxial growth EPITAXY Magnetic anisotropy MAGNETIC FIELDS MAGNETIC FLUX MAGNETIC PROPERTIES Magnetism Magnetron sputtering MAGNETRONS MATERIALS SCIENCE Platinum Residual resistivity SAPPHIRE SPUTTERING SUBSTRATES TRANSMISSION ELECTRON MICROSCOPY X-RAY DIFFRACTION
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Zusammenfassung:	Epitaxial Co/Pt films have been deposited by dc-magnetron sputtering onto heated C-plane sapphire substrates. X-ray diffraction, the residual resistivity, and transmission electron microscopy indicate that the Co/Pt films are highly ordered on the atomic scale. The coercive field and the perpendicular magnetic anisotropy increase as the substrate temperature is increased from 100–250 °C during deposition of the Co/Pt. Measurement of the domain wall creep velocity as a function of applied magnetic field yields the domain wall pinning energy, which scales with the coercive field. Evidence for an enhanced creep velocity in highly ordered epitaxial Co/Pt is found.
ISSN:	0003-6951 1077-3118
DOI:	10.1063/1.4856395