A high-speed photoresist removal process using multibubble microwave plasma under a mixture of multiphase plasma environment

This paper proposes a photoresist removal process that uses multibubble microwave plasma produced in ultrapure water. A non-implanted photoresist and various kinds of ion-implanted photoresists such as B, P, and As were treated with a high ion dose of 5 × 1015 atoms/cm2 at an acceleration energy of...

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Veröffentlicht in:	Applied physics letters 2013-09, Vol.103 (14)
Hauptverfasser:	Ishijima, Tatsuo, Nosaka, Kohei, Tanaka, Yasunori, Uesugi, Yoshihiko, Goto, Yousuke, Horibe, Hideo
Format:	Artikel
Sprache:	eng
Schlagworte:	ACCELERATION ATOMS DISTANCE DOSES KEV RANGE MATERIALS MATERIALS SCIENCE MICROWAVE RADIATION MIXTURES PLASMA PROCESSING RADICALS REMOVAL VELOCITY WATER
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