Optical properties of post-annealed ZnO:Al thin films studied by spectroscopic ellipsometry
In this paper, effects of the thermal annealing on the structural, electrical, and optical properties of Al-doped ZnO (ZnO:Al) thin films prepared by reactive radio-frequency sputtering were investigated. From the X-ray diffraction observations, the orientation of ZnO:Al films was found to be a c-ax...
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Veröffentlicht in: | Materials research bulletin 2012-10, Vol.47 (10), p.2898-2901 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In this paper, effects of the thermal annealing on the structural, electrical, and optical properties of Al-doped ZnO (ZnO:Al) thin films prepared by reactive radio-frequency sputtering were investigated. From the X-ray diffraction observations, the orientation of ZnO:Al films was found to be a c-axis in the hexagonal structure. The optical properties of the films were investigated by optical transmittance and spectroscopic ellipsometry characterization. Based on Tauc–Lorentz model, the optical constants of ZnO:Al films were extracted in the photon energy ranging from 1.0 to 4.5eV. Our result showed that the refractive index and extinction coefficient of the films changed consistently with annealing temperature. |
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ISSN: | 0025-5408 1873-4227 |
DOI: | 10.1016/j.materresbull.2012.04.111 |