Preparation and characterization of indium zinc oxide thin films by electron beam evaporation technique

In this work, the preparation of In 2O 3–ZnO thin films by electron beam evaporation technique on glass substrates is reported. Optical and electrical properties of these films were investigated. The effect of dopant amount and annealing temperature on the optical and electrical properties of In 2O...

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Veröffentlicht in:Materials research bulletin 2011-04, Vol.46 (4), p.615-620
Hauptverfasser: Keshavarzi, Reza, Mirkhani, Valiollah, Moghadam, Majid, Tangestaninejad, Shahram, Mohammadpoor-Baltork, Iraj, Fallah, Hamid Reza, Dastjerdi, Mohammad Javad Vahid, Modayemzadeh, Hamed Reza
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Sprache:eng
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Zusammenfassung:In this work, the preparation of In 2O 3–ZnO thin films by electron beam evaporation technique on glass substrates is reported. Optical and electrical properties of these films were investigated. The effect of dopant amount and annealing temperature on the optical and electrical properties of In 2O 3–ZnO thin films was also studied. Different amount of ZnO was used as dopant and the films were annealed at different temperature. The results showed that the most crystalline, transparent and uniform films with lowest resistivity were obtained using 25 wt% of ZnO annealed at 500 °C.
ISSN:0025-5408
1873-4227
DOI:10.1016/j.materresbull.2010.09.019