Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy
Plasma process control applications require acquisition of diagnostic data at a rate faster than the characteristic timescale of perturbations to the plasma. Diagnostics based on optical emission spectroscopy of intense emission lines permit rapid noninvasive measurements with low-resolution (∼1 nm)...
Gespeichert in:
Veröffentlicht in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2013-03, Vol.31 (2) |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Plasma process control applications require acquisition of diagnostic data at a rate faster than the characteristic timescale of perturbations to the plasma. Diagnostics based on optical emission spectroscopy of intense emission lines permit rapid noninvasive measurements with low-resolution (∼1 nm), fiber-coupled spectrographs, which are included on many plasma process tools for semiconductor processing. Here the authors report on rapid analysis of Ar emissions with such a system to obtain electron temperatures, electron densities, and metastable densities in argon and argon/mixed-gas (Ar/N2, Ar/O2, Ar/H2) inductively coupled plasmas. Accuracy of the results (compared to measurements made by Langmuir probe and white-light absorption spectroscopy) are typically better than ±15% with a time resolution of 0.1 s, which is more than sufficient to capture the transient behavior of many processes, limited only by the time response of the spectrograph used. |
---|---|
ISSN: | 0734-2101 1520-8559 |
DOI: | 10.1116/1.4792671 |