Influence of V/III growth flux ratio on trap states in m-plane GaN grown by ammonia-based molecular beam epitaxy
Deep level transient spectroscopy (DLTS) and deep level optical spectroscopy (DLOS) were utilized to investigate the behavior of deep states in m-plane, n-type GaN grown by ammonia-based molecular beam epitaxy (NH3-MBE) as a function of systematically varied V/III growth flux ratios. Levels were det...
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Veröffentlicht in: | Applied physics letters 2012-10, Vol.101 (15) |
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Sprache: | eng |
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Zusammenfassung: | Deep level transient spectroscopy (DLTS) and deep level optical spectroscopy (DLOS) were utilized to investigate the behavior of deep states in m-plane, n-type GaN grown by ammonia-based molecular beam epitaxy (NH3-MBE) as a function of systematically varied V/III growth flux ratios. Levels were detected at EC − 0.14 eV, EC − 0.21 eV, EC − 0.26 eV, EC − 0.62 eV, EC − 0.67 eV, EC − 2.65 eV, and EC − 3.31 eV, with the concentrations of several traps exhibiting systematic dependencies on V/III ratio. The DLTS spectra are dominated by traps at EC − 0.14 eV and EC − 0.67 eV, whose concentrations decreased monotonically with increasing V/III ratio and decreasing oxygen impurity concentration, and by a trap at EC − 0.21 eV that revealed no dependence of its concentration on growth conditions, suggestive of different physical origins. Higher concentrations of deeper trap states detected by DLOS with activation energies of EC − 2.65 eV and EC − 3.31 eV in each sample did not display measureable sensitivity to the intentionally varied V/III ratio, necessitating further study on reducing these deep traps through growth optimization for maximizing material quality of NH3-MBE grown m-plane GaN. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.4759037 |