Production of a highly charged uranium ion beam with RIKEN superconducting electron cyclotron resonance ion source

A highly charged uranium (U) ion beam is produced from the RIKEN superconducting electron cyclotron resonance ion source using 18 and 28 GHz microwaves. The sputtering method is used to produce this U ion beam. The beam intensity is strongly dependent on the rod position and sputtering voltage. We o...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Review of scientific instruments 2012-02, Vol.83 (2), p.02A333-02A333-3
Hauptverfasser:	Higurashi, Y., Ohnishi, J., Nakagawa, T., Haba, H., Tamura, M., Aihara, T., Fujimaki, M., Komiyama, M., Uchiyama, A., Kamigaito, O.
Format:	Artikel
Sprache:	eng
Schlagworte:	Beams (radiation) Charging ECR ION SOURCES ELECTRIC POTENTIAL Electron cyclotron resonance GHZ RANGE ION BEAMS Ion sources JAPANESE ORGANIZATIONS MICROWAVE RADIATION Microwaves MULTICHARGED IONS PARTICLE ACCELERATORS RADIOWAVE RADIATION SPUTTERING Superconductivity Uranium URANIUM IONS
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!