Production of a highly charged uranium ion beam with RIKEN superconducting electron cyclotron resonance ion source

Production of a highly charged uranium ion beam with RIKEN superconducting electron cyclotron resonance ion source

A highly charged uranium (U) ion beam is produced from the RIKEN superconducting electron cyclotron resonance ion source using 18 and 28 GHz microwaves. The sputtering method is used to produce this U ion beam. The beam intensity is strongly dependent on the rod position and sputtering voltage. We o...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Review of scientific instruments 2012-02, Vol.83 (2), p.02A333-02A333-3
Hauptverfasser: Higurashi, Y., Ohnishi, J., Nakagawa, T., Haba, H., Tamura, M., Aihara, T., Fujimaki, M., Komiyama, M., Uchiyama, A., Kamigaito, O.
Format: Artikel
Sprache:eng
Schlagworte:
Beams (radiation)
Charging
ECR ION SOURCES
ELECTRIC POTENTIAL
Electron cyclotron resonance
GHZ RANGE
ION BEAMS
Ion sources
JAPANESE ORGANIZATIONS
MICROWAVE RADIATION
Microwaves
MULTICHARGED IONS
PARTICLE ACCELERATORS
RADIOWAVE RADIATION
SPUTTERING
Superconductivity
Uranium
URANIUM IONS
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A highly charged uranium (U) ion beam is produced from the RIKEN superconducting electron cyclotron resonance ion source using 18 and 28 GHz microwaves. The sputtering method is used to produce this U ion beam. The beam intensity is strongly dependent on the rod position and sputtering voltage. We observe that the emittance of U 35+ for 28 GHz microwaves is almost the same as that for 18 GHz microwaves. It seems that the beam intensity of U ions produced using 28 GHz microwaves is higher than that produced using 18 GHz microwaves at the same Radio Frequency (RF) power.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.3671743