Fast plasma discharge capillary design as a high power throughput soft x-ray emission source

We present the experimental details and results from a low energy but high repetition rate compact plasma capillary source for extreme ultraviolet and soft x-ray research and applications. Two lengths of capillary are mounted in two versions of a closely related design. The discharge operates in 1.6...

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Veröffentlicht in:Review of scientific instruments 2010-09, Vol.81 (9), p.093502-093502
Hauptverfasser: Wyndham, E. S., Favre, M., Valdivia, M. P., Valenzuela, J. C., Chuaqui, H., Bhuyan, H.
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Sprache:eng
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Zusammenfassung:We present the experimental details and results from a low energy but high repetition rate compact plasma capillary source for extreme ultraviolet and soft x-ray research and applications. Two lengths of capillary are mounted in two versions of a closely related design. The discharge operates in 1.6 and 3.2 mm inner diameter alumina capillaries of lengths 21 and 36 mm. The use of water both as dielectric and as coolant simplifies the compact low inductance design with nanosecond discharge periods. The stored electrical energy of the discharge is approximately 0.5 J and is provided by directly charging the capacitor plates from an inexpensive insulated-gate bipolar transistor in 1   μ s or less. We present characteristic argon spectra from plasma between 30 and 300 Å as well as temporally resolved x-ray energy fluence in discrete bands on axis. The spectra also allow the level of ablated wall material to be gauged and associated with useful capillary lifetime according to the chosen configuration and energy storage. The connection between the electron beams associated with the transient hollow cathode mechanism, soft x-ray output, capillary geometry, and capillary lifetime is reported. The role of these e-beams and the plasma as measured on-axis is discussed. The relation of the electron temperature and the ionization stages observed is discussed in the context of some model results of ionization in a non-Maxwellian plasma.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.3482070