Reversible wettability of electron-beam deposited indium-tin-oxide driven by ns-UV irradiation
Indium tin oxide (ITO) is one of the most widely used semiconductor oxides in the field of organic optoelectronics, especially for the realization of anode contacts. Here the authors report on the control of the wettability properties of ITO films deposited by reactive electron beam deposition and i...
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Veröffentlicht in: | Applied physics letters 2012-04, Vol.100 (15), p.151607-151607-4 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Indium tin oxide (ITO) is one of the most widely used semiconductor oxides in the field of organic optoelectronics, especially for the realization of anode contacts. Here the authors report on the control of the wettability properties of ITO films deposited by reactive electron beam deposition and irradiated by means of nanosecond-pulsed UV irradiation. The enhancement of the surface water wettability, with a reduction of the water contact angle larger than 50°, is achieved by few tens of seconds of irradiation. The analyzed photo-induced wettability change is fully reversible in agreement with a surface-defect model, and it can be exploited to realize optically transparent, conductive surfaces with controllable wetting properties for sensors and microfluidic circuits. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.3701590 |